{"title":"Chapter 10 – Epitaxial Silicon Wafers using Plasma-Enhanced, Chemical-Vapor-Deposition","authors":"T. Sinno, W. Seider","doi":"10.1016/S1570-7946(07)80013-7","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":222677,"journal":{"name":"Computer-aided chemical engineering","volume":"32 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-12-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Computer-aided chemical engineering","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1016/S1570-7946(07)80013-7","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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