Synthesis and Characterization of ZnO Thin Layers using Sol-Gel Spin Coating Method

Sukainil Ahzan, D. Darminto, F. A. A. Nugroho, S. Prayogi
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引用次数: 2

Abstract

The potential of thin layer in many applications has led to research on the development of many new materials and their fabrication methods. This study aimed to synthesize a thin layer of ZnO using the facile and low-cost sol-gel spin coating method. The ZnO thin layer is deposited on a glass substrate and analyzed to observe the influence of the deposition variables such as heating and rotation speed, and its aging. The characterization methods include the identification of the formed phase using X-Ray Diffractometer (XRD), and the microstructure and elemental composition using Scanning Electron Microscopy (SEM) coupled with EDS (Energy Dispersive Spectrometer). The study shows that a thin layer of ZnO is successfully deposited on a glass substrate by heat treatment at temperatures of 300 oC and 500 oC. Furthermore, XRD reveals that higher heating temperatures result in higher diffraction peak intensity. At a heating temperature of 300 °C crystals are formed but are not yet perfectly oriented, while they are at 500 °C. On the other hand, higher spin coating rotation speed gives rise to lower intensity of diffraction peak. The ZnO crystallization is easier to form in the coating process with a lower rotation (1500 rpm). Interestingly, the thin layer is stable over time where there is no significant change in each sample, both in terms of intensity and width of the ZnO crystal peak. The results indicate that gel precursor aged less than two days can form ZnO crystals. Finally, SEM results show that the surface morphology of the ZnO layer heated at 500 oC has an average grain size of 300 nm. Based on the cross-sectional results of SEM shows that the higher the coating rotation speed has resulted the thinner of the ZnO layer, where the thickness of the resulting layer is on order >5 mm.
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溶胶-凝胶自旋镀膜法制备ZnO薄层及表征
薄层在许多应用中的潜力导致了许多新材料及其制造方法的研究发展。本研究旨在采用简单、低成本的溶胶-凝胶自旋镀膜方法合成一层薄薄的ZnO。将ZnO薄层沉积在玻璃基板上,分析观察了加热、转速等沉积变量对ZnO薄层的影响及其时效。表征方法包括用x射线衍射仪(XRD)鉴定形成的相,用扫描电子显微镜(SEM)和能谱仪(EDS)耦合表征微观结构和元素组成。研究表明,在300℃和500℃的温度下,在玻璃基板上成功地沉积了一层薄薄的ZnO。XRD分析表明,加热温度越高,衍射峰强度越大。在300°C的加热温度下,晶体形成但尚未完全定向,而在500°C的加热温度下,晶体形成。另一方面,较高的自旋涂层转速会降低衍射峰的强度。在较低转速(1500转/分)的涂层过程中更容易形成ZnO结晶。有趣的是,随着时间的推移,薄层是稳定的,每个样品在ZnO晶体峰的强度和宽度方面都没有显着变化。结果表明,凝胶前驱体时效小于2天即可形成ZnO晶体。最后,SEM结果表明,在500℃加热时,ZnO层的表面形貌平均晶粒尺寸为300 nm。SEM的横截面结果表明,涂层转速越高,ZnO层越薄,其厚度约为0.5 mm。
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