Techniques for nano-scale deformation measurement

Su Fei, Sun Yaofeng, Shi Xunqing, Wong Chee Khuen Stephen
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引用次数: 2

Abstract

Deformation measurement of mechanical-electrical devices is important for their reliability evaluation. However, with the development of fabrication technology, sizes of mechanical-electrical devices are reduced to micro or even nano-scale. Correspondingly, testing resolution of the required metrology techniques must be improved to the same or even higher level. The commonly used characterization facility with nano-scale resolution is STM/AFM/SEM etc. In this paper, some metrology technologies based on these facilities for nano-scale deformation measurement, e.g. AFM/SEM moire and AFM/SEM digital speckle correlation are introduced, including their principles, advantages and disadvantages. Their applications in the deformation/strain measurement of MEMS and IC packages are highlighted.
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纳米尺度变形测量技术
机电设备的变形测量是机电设备可靠性评估的重要内容。然而,随着制造技术的发展,机电器件的尺寸逐渐缩小到微级甚至纳米级。相应的,所要求的计量技术的测试分辨率也必须提高到相同甚至更高的水平。常用的纳米级分辨率表征设备有STM/AFM/SEM等。本文介绍了基于这些设备的纳米尺度形变测量技术,如AFM/SEM云纹和AFM/SEM数字散斑相关,包括它们的原理和优缺点。重点介绍了它们在MEMS和IC封装的变形/应变测量中的应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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