Reverse-order source/drain formation with double offset spacer (RODOS) for CMOS low-power, high-speed and low-noise amplifiers

W. Choi, J. Lee, Byung-Gook Park
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Abstract

RODOS (Reverse-Order source/drain formation with Double Offset Spacer) was proposed for low-power, high-speed and low-noise amplifiers. Relying on simulation data, we confirmed the high feasibility of the RODOS process. It showed improved performance in linearity (V/sub IP3/). Additionally, by optimizing process parameters, we achieved small gate delay (CV/I) and low static/dynamic power consumption. The process satisfied most of the requirements of LOP and LSTP in ITRS 2002. Finally, we found that devices with the RODOS structure can be a promising alternative to implement low-power, high-speed and low-noise amplifiers for radio on a chip.
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具有双偏置间隔(RODOS)的CMOS低功耗,高速和低噪声放大器的反序源漏形成
提出了用于低功耗、高速、低噪声放大器的RODOS(带双偏置间隔器的反向源漏形成)。通过仿真数据验证了RODOS工艺的高可行性。线性度(V/sub IP3/)有所提高。此外,通过优化工艺参数,我们实现了小栅极延迟(CV/I)和低静态/动态功耗。该工艺满足ITRS 2002中LOP和LSTP的大部分要求。最后,我们发现具有RODOS结构的器件可以成为在芯片上实现低功耗,高速和低噪声无线电放大器的有希望的替代方案。
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