Infrared photoconductivity of InGaAs/GaAs heterostructures with quantum dots

V. Shashkin, V. Daniltsev, M. Drozdov, Y. Drozdov, V. Zakamov, A. Lukyanov, L. Moldavskaya, A. Murel
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Abstract

A new variant of fabricating of heterostructures with InAs quantum dots for infrared photodetectors by metalorganic chemical vapor deposition is discussed. A distinctive feature of the growth process is alternation of low and high temperature during growth of GaAs barrier layers. Sandwich structures with high density of quantum dots with high "aspect ratio" value have been grown by use of increased time of quantum dots growth. In these structures photoconductivity near to 4.5 μm is observed up to 200K. Responsitivity is O.5A/W at a temperature of 90K, detectivity is 3*109 cmHz1/2W-1. Peculiarities of lateral infrared photoconductivity and electron transport in heterostructures with quantum dots and the two-dimensional electron channel connected with change in the mobility of 2D electrons caused by photoionization of quantum dots are shown. The first observation of the lateral intraband infrared photoconductivity in non-doped structures at additional photoexcitation as well as lateral interband photoconductivity in the range 1-2.7 μm at room temperature is reported.
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具有量子点的InGaAs/GaAs异质结构的红外光电性
讨论了金属有机化学气相沉积法制备红外探测器用InAs量子点异质结构的新方法。生长过程的一个显著特征是在GaAs势垒层生长过程中低温和高温交替。利用增加量子点生长时间的方法,可以生长出具有高纵横比值的高密度量子点夹层结构。在200K温度下,这些结构的光电导率接近4.5 μm。在温度为90K时,响应度为0.5 a /W,探测率为3*109 cmHz1/2W-1。揭示了量子点异质结构中横向红外光导率和电子输运的特性,以及量子点光电离引起的二维电子迁移率变化所导致的二维电子通道。本文首次在室温下观察到非掺杂结构在外加光激发下的带内横向红外光导率以及1 ~ 2.7 μm范围内的带间横向光导率。
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