X-ray qualification of hydrogenated amorphous silicon sensors on flexible substrate

M. Menichelli, L. Antognini, A. Bashiri, M. Bizzarri, L. Calcagnile, M. Caprai, A. Caricato, R. Catalano, G. Cirrone, T. Croci, G. Cuttone, S. Dunand, M. Fabi, L. Frontini, C. Grimani, M. Ionica, K. Kanxheri, M. Large, V. Liberali, M. Martino, G. Maruccio, G. Mazza, A. Monteduro, A. Morozzi, F. Moscatelli, S. Pallotta, A. Papi, D. Passeri, M. Pedio, M. Petasecca, G. Petringa, F. Peverini, L. Piccolo, P. Placidi, G. Quarta, S. Rizzato, G. Rossi, Federico Sabbatini, A. Stabile, L. Servoli, C. Talamonti, L. Tosti, M. Villani, R. Wheadon, N. Wyrsch, N. Zema
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引用次数: 1

Abstract

Hydrogenated amorphous silicon (a-Si:H) is a well known material for its radiation resistance and for the possibility of deposition on flexible substrates like Polyimide (PI), polyethylene terephthalate (PET) or polyethylene naphthalate (PEN). Due to the properties of a-Si:H its usage for dosimetry, beam monitoring for particle physics and nuclear medicine, as well as, radiation flux measurement for space applications and neutron flux measurement can be foreseen. In this paper the dosimetric X-ray response of p-i-n diodes deposited on Polyimide will be studied. In particular we will study the linearity of the photocurrent response to X-rays versus dose-rate from which we will extract the dosimetric sensitivity at various bias voltages. We will repeat this study for devices having two different areas (2 mm x 2 mm and 5 mm x 5 mm) also a measurement of stability of X-ray response versus time will be shown.
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柔性衬底氢化非晶硅传感器的x射线鉴定
氢化非晶硅(a- si:H)是一种众所周知的材料,因为它具有抗辐射性能,并且可以沉积在聚酰亚胺(PI)、聚对苯二甲酸乙二醇酯(PET)或聚萘二甲酸乙二醇酯(PEN)等柔性衬底上。由于a-Si:H的特性,可以预见它将用于剂量学、粒子物理和核医学的束流监测,以及空间应用的辐射通量测量和中子通量测量。本文研究了沉积在聚酰亚胺上的p-i-n二极管的剂量学x射线响应。特别地,我们将研究光电流对x射线的响应与剂量率的线性关系,从中我们将提取不同偏置电压下的剂量学灵敏度。我们将对具有两个不同区域(2mm x 2mm和5mm x 5mm)的设备重复此研究,并将显示x射线响应随时间的稳定性测量。
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