A Ku-Band High-Integrated CMOS Power Amplifier

Xiao Li, Wei Lv, Yongjie Li, Yan Wang, Siwei Huang, Zongming Duan
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Abstract

In order to improve output power of Si-based transmitter, a Ku-band highly-integrated power amplifier is designed, fabricated and measured. The proposed amplifier adopts a two-stage common-source differential topology, and capacitor-neutralized technology is used both stages in order to enhance the stability and gain performance of amplifier by neutralizing the gate-drain parasitic capacitance. For improving the output power, the second-stage employ a two-way power-combining structure, and the transformer-based power combiner is designed according to the optimum impedance of power matching. The measured results indicate that the power amplifier achieve 26.8 dB gain, 17.4 dBm 1-dB-compressed output power, 22.6 dBm saturated output power and 30% peak power added efficiency at 15.5 GHz with 570 mW DC power consumption.
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一种ku波段高集成CMOS功率放大器
为了提高硅基发射机的输出功率,设计、制作并测量了一种ku波段高集成功率放大器。该放大器采用两级共源差分拓扑结构,两级均采用电容中和技术,通过中和门漏寄生电容来提高放大器的稳定性和增益性能。为提高输出功率,第二级采用双向功率组合结构,并根据功率匹配的最佳阻抗设计基于变压器的功率组合器。测量结果表明,该功率放大器在15.5 GHz工作频段的增益为26.8 dB,压缩1db输出功率为17.4 dBm,饱和输出功率为22.6 dBm,峰值功率增加效率为30%,直流功耗为570 mW。
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