Effect of repetition rate on morphology of generated microstructure on silicon surface using low cost N2 laser in air medium

P. C. Singh, M. Alrefaee, S. Das
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Abstract

The systematic investigation has been carried out on the effect of repetition rate on morphology of the Si microstructures generated using an inexpensive Nitrogen (N2) nanosecond (ns) laser. The wavelength, pulse duration and pulse energy of the used laser are 337nm, ∼3.5ns and 170µJ respectively. The repetition rate of the laser was varied from 5Hz to 20Hz at constant sample scanning velocity of 0.005mm/s. All the experiments were carried out in the air medium. The morphological characterization of the produced microtextured Si were done by an ImageJ software calibrated USB Digital Microscope Endoscope Camera (UDMEC) and Field Emission Scanning Electron Microscope (FESEM). At constant sample velocity with low repetition rate, the periodic gratings like microstructures were observed on Si surface. With the increase of the repetition rate to 10Hz and 12Hz, the channel like groove based microstructures were generated. Further increasing the repetition rate to highest values of 20Hz, we observe the grooved based microstructures. It is also demonstrated that the width of the processed region can be increased with increase of the repetition rate. This significant optimized processing parameters using N2 ns laser microtextured Si surface is suitable for the generation Black Si in large area for the wide field of applications.The systematic investigation has been carried out on the effect of repetition rate on morphology of the Si microstructures generated using an inexpensive Nitrogen (N2) nanosecond (ns) laser. The wavelength, pulse duration and pulse energy of the used laser are 337nm, ∼3.5ns and 170µJ respectively. The repetition rate of the laser was varied from 5Hz to 20Hz at constant sample scanning velocity of 0.005mm/s. All the experiments were carried out in the air medium. The morphological characterization of the produced microtextured Si were done by an ImageJ software calibrated USB Digital Microscope Endoscope Camera (UDMEC) and Field Emission Scanning Electron Microscope (FESEM). At constant sample velocity with low repetition rate, the periodic gratings like microstructures were observed on Si surface. With the increase of the repetition rate to 10Hz and 12Hz, the channel like groove based microstructures were generated. Further increasing the repetition rate to highest values of 20Hz, we observe the grooved b...
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低成本氮气激光在空气介质中对硅表面生成微观结构的影响
本文系统地研究了重复频率对廉价的氮(N2)纳秒(ns)激光生成的硅微结构形貌的影响。所用激光器的波长为337nm,脉冲持续时间为~ 3.5ns,脉冲能量为170µJ。在恒定的样品扫描速度为0.005mm/s的情况下,激光的重复频率在5Hz ~ 20Hz之间变化。所有实验都是在空气介质中进行的。利用ImageJ软件校准的USB数码显微镜内窥镜相机(UDMEC)和场发射扫描电子显微镜(FESEM)对制备的微织构硅进行形态学表征。在低重复率的恒定取样速度下,在硅表面观察到类似周期性光栅的微结构。当重复频率增加到10Hz和12Hz时,产生了沟槽状的微结构。进一步提高重复频率至20Hz的最高值,我们观察到沟槽基显微组织。实验还表明,处理区域的宽度可以随着重复频率的增加而增加。利用n2ns激光微织构硅表面的工艺参数进行了显著优化,适用于大面积生成黑硅,应用领域广泛。本文系统地研究了重复频率对廉价的氮(N2)纳秒(ns)激光生成的硅微结构形貌的影响。所用激光器的波长为337nm,脉冲持续时间为~ 3.5ns,脉冲能量为170µJ。在恒定的样品扫描速度为0.005mm/s的情况下,激光的重复频率在5Hz ~ 20Hz之间变化。所有实验都是在空气介质中进行的。利用ImageJ软件校准的USB数码显微镜内窥镜相机(UDMEC)和场发射扫描电子显微镜(FESEM)对制备的微织构硅进行形态学表征。在低重复率的恒定取样速度下,在硅表面观察到类似周期性光栅的微结构。当重复频率增加到10Hz和12Hz时,产生了沟槽状的微结构。进一步增加重复频率至20Hz的最大值,我们观察到沟槽b…
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