Wide injection range OCVD system for lifetime spectroscopy techniques

S. Lacouture, J. Schrock, E. Hirsch, S. Bayne, H. O’Brien, A. Ogunniyi
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Abstract

To continually increase the voltage and current capabilities of power semiconductor devices, whether pushing older materials such as Si to its' intrinsic electrical limits or by employing newer substances like SiC or GaN, a thorough understanding of the entire device is required, from the basic physics of the material and its interactions with defects and passivation, up to the complete device structure, including terminal performance and device — level limitations. Of the fundamental parameters that affect device performance, the most complex and malleable is the carrier lifetime. Carrier lifetime has a profound effect on power devices designed for high voltage applications and power devices relying on conductivity modulation. This parameter cannot be given as a ball — park figure unlike mobility (and hence diffusion coefficients) as it is affected by nearly every processing step a device undergoes: a final device can have carrier lifetimes that differ drastically from the starting bulk material. The work herein utilizes a relatively new set of techniques collectively known as Lifetime Spectroscopy (LS) methods to extract fundamental material parameters relating to recombination activity: τη0, τρ0 and AEt. These LS methods directly measure recombination activity of defects and hence acquire characteristic data of defects and dopants that is complimentary in nature to the information gleaned about them from more orthodox methods such as Deep — Level Transient Spectroscopy (DLTS). The Open Circuit Voltage Decay (OCVD) method is used along with improved data manipulation algorithms to extract the effective carrier lifetime as injection and temperature are swept. A complete stand — alone system has been constructed that allows a very wide range of current injection (∼1mA to > 200A) and built — in OCVD waveform acquisition. The first complete Temperature — Injection Dependent Lifetime Spectroscopy (T-IDLS) studies are carried out on a small signal PiN commercial diode.
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用于寿命光谱技术的宽注射范围OCVD系统
为了不断提高功率半导体器件的电压和电流能力,无论是将Si等旧材料推向其固有电极限,还是采用SiC或GaN等新物质,都需要对整个器件进行彻底的了解,从材料的基本物理性质及其与缺陷和钝化的相互作用,到完整的器件结构,包括终端性能和器件级限制。在影响器件性能的基本参数中,最复杂和最具延展性的是载波寿命。载流子寿命对设计用于高压应用的功率器件和依赖电导率调制的功率器件具有深远的影响。该参数不能像迁移率(因此扩散系数)那样给出一个大致的数字,因为它几乎受到设备经历的每个处理步骤的影响:最终设备的载流子寿命可能与初始体材料有很大不同。本文的工作采用了一套相对较新的技术,统称为寿命光谱(LS)方法来提取与重组活性相关的基本材料参数:τη0, τρ0和AEt。这些LS方法直接测量缺陷的重组活性,从而获得缺陷和掺杂物的特征数据,这些数据与从更正统的方法(如深能级瞬态光谱(DLTS))收集到的信息在本质上是互补的。利用开路电压衰减(OCVD)方法和改进的数据处理算法提取注入和温度扫描时的有效载流子寿命。已经构建了一个完整的独立系统,允许非常宽的电流注入范围(~ 1mA到> 200A)和内置的OCVD波形采集。第一个完整的温度注入依赖寿命光谱(T-IDLS)研究是在一个小信号PiN商业二极管上进行的。
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