{"title":"Spectroscopic thin film thickness measurement system for semiconductor industries","authors":"M. Horie, N. Fujiwara, M. Kokubo, N. Kondo","doi":"10.1109/IMTC.1994.352008","DOIUrl":null,"url":null,"abstract":"Accurate film thickness controls are indispensable for manufacturing defect-free semiconductor devices. Moreover, recent high integration requires simultaneous measurement of each film thickness and optical constants in multi-layers. This paper explains a microspectroscopic film thickness measurement system that measures film thickness at a very small spot (several micrometers in diameter) in several angstrom increments. This system also enables you to measure film thickness on bulk wafers and SOI wafers, and determine optical constants of unknown films.<<ETX>>","PeriodicalId":231484,"journal":{"name":"Conference Proceedings. 10th Anniversary. IMTC/94. Advanced Technologies in I & M. 1994 IEEE Instrumentation and Measurement Technolgy Conference (Cat. No.94CH3424-9)","volume":"24 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1994-05-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Proceedings. 10th Anniversary. IMTC/94. Advanced Technologies in I & M. 1994 IEEE Instrumentation and Measurement Technolgy Conference (Cat. No.94CH3424-9)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMTC.1994.352008","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
Accurate film thickness controls are indispensable for manufacturing defect-free semiconductor devices. Moreover, recent high integration requires simultaneous measurement of each film thickness and optical constants in multi-layers. This paper explains a microspectroscopic film thickness measurement system that measures film thickness at a very small spot (several micrometers in diameter) in several angstrom increments. This system also enables you to measure film thickness on bulk wafers and SOI wafers, and determine optical constants of unknown films.<>
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