{"title":"Integrated grid technology","authors":"G. Dohler, A. Rengan, F. Scafuri","doi":"10.1109/IEDM.1980.189870","DOIUrl":null,"url":null,"abstract":"A new concept for integrated cathode grid structures is presented. Two fine photo etched grids of similar geometry are brazed into a sandwich structure where they remain spaced and electrically isolated from each other by small dielectric posts. The fabrication and testing of structures based on this concept has required a study of insulating materials at elevated temperatures and grid emission suppression schemes, the results of which are discussed. Life test results are related to physico-chemical processes taking place in the direct environment of thermionic cathodes.","PeriodicalId":180541,"journal":{"name":"1980 International Electron Devices Meeting","volume":"15 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1980 International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.1980.189870","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract
A new concept for integrated cathode grid structures is presented. Two fine photo etched grids of similar geometry are brazed into a sandwich structure where they remain spaced and electrically isolated from each other by small dielectric posts. The fabrication and testing of structures based on this concept has required a study of insulating materials at elevated temperatures and grid emission suppression schemes, the results of which are discussed. Life test results are related to physico-chemical processes taking place in the direct environment of thermionic cathodes.
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