Algorithm for analyzing optimal mask movement pattern in moving mask deep X-ray lithography

Abstract

Moving mask deep X-ray lithography has demonstrated its feasibility for fabricating some 3-dimensional (3D) microstructures such as micro-nozzles and micro-lens arrays and so on. In this technique, the determination of mask movement patterns is crucial for realizing the desired target microstructures. For theoretical determination of optimal movement patterns, an algorithm exploiting the Fourier transformation technique called "Inverse Approach" was proposed. As a first step towards the completion of the Inverse Approach, the algorithm limited to the 2 space dimensions, vertical and lateral, was developed. Straightforward application of this algorithm to the fabrication of V-shaped grooves did not yield satisfying results. We reported an adopted version of this algorithm which ultimately allowed successful fabrication of the V-shaped grooves. Furthermore, this algorithm could be applied to the determination of an optimal mask.