Conductance of graphene: Role of metal contact, charge puddles and differential gating

R. Sajjad, F. Tseng, Avik W. Ghosh
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引用次数: 1

Abstract

We demonstrate how several experiments on graphene transport can be explained semi-quantitatively within a Non-Equilibrium Green's Function (NEGF) formalism. The key features are controlled by-(i) the boundary potential established at a metal-graphene interface,(ii) charge puddles that help the conductivity in the ballistic limit and hurt in the diffusive limit and (iii) alignment of the local Dirac points in a multiply gated segment. Simulations reveal that at the ballistic limit, the conductance depends on the aspect ratio which controls tunneling from source to drain and across the metal-graphene interface. We show that the boundary potential VB at the interface together with Metal Induced Doping (MID) are critical to graphene transport-specifically, the maximum conductance achievable with a given metal contact, the electron-hole asymmetry (EHA) and the peak device resistance. The boundary potential is formed due to in-plane charge transfer from metal covered graphene to graphene on substrate [1] and may produce an additional smooth pn junction, typically ignored in existing models. In the experiments however, the contact resistance heavily depends on the fabrication procedure [2], varying from hundreds of Ω- μm to several thousands of Ω- μm [3]. A rigorous model of the performance limits of several contacts and change of carrier transport from ballistic to diffusive regime is lacking. We report the upper limit of the performance of various metal-graphene contacts and compare with the best available experimental values. To reach experimental dimensions, we use tight-binding real space calculations as well as the powerful KSF-RGFA approach (combination of K Space Formalism (KSF) and Recursive Green's Function Algorithm (RGFA) [4]), which allows us to simulate devices as large as microns in size.
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石墨烯的电导率:金属接触、电荷坑和差动门控的作用
我们演示了几个关于石墨烯输运的实验如何在非平衡格林函数(NEGF)形式体系中半定量地解释。关键特征由以下因素控制:(i)在金属-石墨烯界面上建立的边界电位,(ii)在弹道极限下有助于电导率而在扩散极限下有害的电荷水坑,以及(iii)在多门控段中局部狄拉克点的排列。模拟表明,在弹道极限下,电导率取决于纵横比,纵横比控制着从源极到漏极以及穿过金属-石墨烯界面的隧道。研究表明,界面处的边界电位VB和金属诱导掺杂(MID)对石墨烯的传输至关重要,特别是在给定金属接触下可实现的最大电导、电子-空穴不对称(EHA)和器件峰值电阻。边界电位是由于平面内电荷从金属覆盖的石墨烯转移到衬底上的石墨烯而形成的[1],并可能产生额外的光滑pn结,这在现有模型中通常被忽略。然而,在实验中,接触电阻很大程度上取决于制造工艺[2],从数百个Ω- μm到数千个Ω- μm不等[3]。目前还没有一个严格的模型来描述几种接触的性能极限以及载流子输运从弹道到扩散的变化。我们报告了各种金属-石墨烯接触性能的上限,并与现有的最佳实验值进行了比较。为了达到实验维度,我们使用了紧密绑定的实际空间计算以及强大的KSF-RGFA方法(K空间形式(KSF)和递归格林函数算法(RGFA)[4]的组合),这使我们能够模拟微米大小的设备。
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