Surface recombination velocity and lifetime in InP measured by transient microwave reflectance

S. Bothra, S. Tyagi, S. Ghandhi, J. Borrego
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引用次数: 7

Abstract

Minority carrier lifetime and surface recombination velocity are determined in organometallic vapor-phase epitaxy (OMVPE)-grown InP by a contactless microwave technique. For lightly doped n-type InP, a surface recombination velocity of 5000 cm/s is measured. However, in solar cells with a heavily doped n-type emitter a surface recombination velocity of 1*10/sup 6/ cm/s is observed. Possible reasons for this due to surface pinning are discussed. The effects of various chemical treatments and SiO on the surface recombination velocity are measured.<>
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瞬态微波反射测量InP表面复合速度和寿命
采用非接触微波技术测定了有机金属气相外延(OMVPE)生长InP的少数载流子寿命和表面复合速度。对于轻掺杂的n型InP,测得表面复合速度为5000 cm/s。然而,在具有重掺杂n型发射极的太阳能电池中,观察到表面复合速度为1*10/sup 6/ cm/s。讨论了由于表面钉住造成这种情况的可能原因。测量了不同化学处理和SiO对表面复合速度的影响。
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