Phase measurement system for meta-lens

M. Chen, Maoxiong Zhao, Ze-peng Zhuang, Yongfeng Wu, Xiaoyuan Liu, Yan Yue, Jingcheng Zhang, Jiaqi Yuan, Zhengnan Zhang, Shumin Xiao, Lei Shi, Jianwen Dong, J. Zi, D. Tsai
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Abstract

In recent years, Meta-lens has become a new type of optical device, showing excellent performance and novel applications. The nanoantennas of meta-lens can be used to control the phase, amplitude, and polarization at well. The phase part is the most important part of the function of the meta-lens. However, so far, the phase distribution of meta-lenses has not been directly measured, which further hinders the quantitative evaluation of their performance. We have developed an interferometric imaging phase measurement system for meta-lens and meta-devices. This system can measure the phase distribution by shooting the interference pattern. The phase distribution of meta-lenses can be measured to quantitatively characterize the imaging performance. Our meta-lens phase measurement system can help for designers to optimize the design, for manufacturers to identify defects, thereby improving the manufacturing process. This work will pave the way for meta-lens in industrial applications.
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超透镜相位测量系统
近年来,元透镜已成为一种新型的光学器件,具有优异的性能和新颖的应用。超透镜的纳米天线可以很好地控制相位、振幅和偏振。相位部分是元透镜功能中最重要的部分。然而,到目前为止,还没有直接测量到元透镜的相位分布,这进一步阻碍了对其性能的定量评价。我们开发了一种用于元透镜和元器件的干涉成像相位测量系统。该系统可以通过拍摄干涉图来测量相位分布。通过测量元透镜的相位分布,可以定量表征其成像性能。我们的元透镜相位测量系统可以帮助设计人员优化设计,帮助制造商识别缺陷,从而改善制造过程。这项工作将为超透镜的工业应用铺平道路。
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Front Matter: Volume 11797 Mark Stockman Tribute Enhancement of optical nonlinearity and spontaneous emission in nano-engineered epsilon-near-zero materials Plasmonic metaplatforms for enhanced light control Excitonic semiconductors on plasmonic substrates: optical and electronic effects
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