Corrosion Protective Coatings: Fabrication of Sputtered CeO2-La2O3 and La2O3-CeO2 Bilayers

Domínguez-Crespo Miguel Antonio, Brachetti-Sibaja Silvia, Torres-Huerta Aidé, Onofre Edgar, L. Ana, Rodil Sandra
{"title":"Corrosion Protective Coatings: Fabrication of Sputtered CeO2-La2O3 and La2O3-CeO2 Bilayers","authors":"Domínguez-Crespo Miguel Antonio, Brachetti-Sibaja Silvia, Torres-Huerta Aidé, Onofre Edgar, L. Ana, Rodil Sandra","doi":"10.1201/9781351045636-140000216","DOIUrl":null,"url":null,"abstract":"This entry provides a comparative study on the corrosion protection efficiency of Ce, La films as well as Ce/La- and La/Ce-bilayered coatings deposited onto AA7075 and AA6061 substrates by the radio frequency magnetron sputtering technique. The coating thickness ranged from ~12 to 835 nm, which changed with the deposition parameters and substrate composition. The relationship between microstructure, roughness, and electrochemical performance is examined. The reactivity and crystallinity of rare earth (RE) films can be tailored by adjusting the sputtering parameters. Sputtered La films with a thickness of ~390 nm and an average roughness of 66 nm showed the best corrosion protection properties in chloride medium as determined by potentiodynamic curves and electrochemical impedance spectroscopy. The method to obtain RE-bilayered coatings, i.e., La/Ce or Ce/La as well as the substrate composition and applied power, conditioned their inhibition properties. The RE-bilayered coatings displayed better barrier properties than Ce films, which were worser than those featured by La films.","PeriodicalId":348912,"journal":{"name":"Encyclopedia of Aluminum and Its Alloys","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-11-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Encyclopedia of Aluminum and Its Alloys","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1201/9781351045636-140000216","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

This entry provides a comparative study on the corrosion protection efficiency of Ce, La films as well as Ce/La- and La/Ce-bilayered coatings deposited onto AA7075 and AA6061 substrates by the radio frequency magnetron sputtering technique. The coating thickness ranged from ~12 to 835 nm, which changed with the deposition parameters and substrate composition. The relationship between microstructure, roughness, and electrochemical performance is examined. The reactivity and crystallinity of rare earth (RE) films can be tailored by adjusting the sputtering parameters. Sputtered La films with a thickness of ~390 nm and an average roughness of 66 nm showed the best corrosion protection properties in chloride medium as determined by potentiodynamic curves and electrochemical impedance spectroscopy. The method to obtain RE-bilayered coatings, i.e., La/Ce or Ce/La as well as the substrate composition and applied power, conditioned their inhibition properties. The RE-bilayered coatings displayed better barrier properties than Ce films, which were worser than those featured by La films.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
防腐蚀涂层:溅射CeO2-La2O3和La2O3-CeO2双层膜的制备
本文对比研究了采用射频磁控溅射技术在AA7075和AA6061基体上沉积Ce、La膜以及Ce/La-和La/Ce双层涂层的防腐效果。涂层厚度随沉积参数和衬底成分的变化而变化,范围为~12 ~ 835 nm。研究了微结构、粗糙度和电化学性能之间的关系。通过调整溅射参数,可以调整稀土薄膜的反应性和结晶度。电势动力学曲线和电化学阻抗谱分析表明,厚度为~390 nm、平均粗糙度为66 nm的溅射La膜在氯离子介质中的防腐性能最好。获得re双层涂层的方法,即La/Ce或Ce/La,以及衬底成分和施加功率,决定了它们的缓蚀性能。re -双层膜的阻隔性能优于Ce膜,而La膜的阻隔性能较差。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Welding Parameters for Aluminum Alloys Computer Vision for Fault Detection in Aluminum Castings Quality Parameters for High-Pressure Diecastings 6XXX Alloys: Chemical Composition and Heat Treatment Quench Factor Analysis
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1