Anomalous Hall effect in a double-layer Ni / Gd2O3 nanosized films

A. Kasumov, A. Dmitriev, M. Radchenko, A. E. Baybara, O. Bykov, K. A. Korotkov, V. Karavaeva, K. O. Vyshnevska, O. Olifan, A. Ievtushenko
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引用次数: 1

Abstract

It has been shown by the anomalous Hall effect method that upon contact of layers of iron group metal (Ni) and REM oxide (Gd2O3) nanosized films, an increase by 15–35 % in the magnetization of the ferromagnetic metal is observed. Such an increase does not require energy consumption and the use of amplifying equipment, is very promising for nanotechnology. The enhancement of magnetization is due to the appearance in the contact region of the exchange f–d interaction between atoms with empty d– and f–electron shells that are parts of the layers. The exchange interaction stimulates the ordering of the magnetic structure of the ferromagnetic metal and an increase in its magnetization. The possibility of exchange f–d interaction in the region of contact of layers of metals of the iron group and REM oxides was confirmed by the method of electronic paramagnetic resonance in our previous studies. This paper also shows the lack of influence on the growth of magnetization of other possible mechanisms due to the difference in the parameters of the crystal lattice, resistance, magnetic and termomagnetic properties of the contacting layers. A mathematical connection is found of the potential of Hall contacts and additional magnetization stimulated by the exchange f–d interaction. Using this relationship, the mechanism of the effect of an external magnetic field on additional magnetization had revealed. It is shown that this magnetization depends on the ratio of the thicknesses of the Ni and Gd2O3 layers. It has been found that the vector of this magnetization is directed from the Gd2O3 layer to the Ni layer.
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双层Ni / Gd2O3纳米薄膜中的反常霍尔效应
反常霍尔效应方法表明,当铁族金属(Ni)与REM氧化物(Gd2O3)纳米薄膜层接触时,铁磁性金属的磁化强度增加了15 - 35%。这样的增加不需要能源消耗和使用放大设备,对于纳米技术来说是非常有前途的。磁化强度的增强是由于原子之间的交换f-d相互作用的接触区域出现了空的d -和f -电子壳层,它们是层的一部分。交换相互作用刺激铁磁金属的磁性结构有序,并增加其磁化强度。在以往的研究中,我们用电子顺磁共振的方法证实了铁族金属层与REM氧化物接触区域中交换f-d相互作用的可能性。本文还表明,由于接触层的晶格、电阻、磁性和热磁性参数的差异,其他可能的机制对磁化强度的增长没有影响。发现了霍尔触点的电势与交换f-d相互作用所激发的附加磁化之间的数学联系。利用这一关系,揭示了外加磁场对外加磁化强度影响的机理。结果表明,这种磁化强度取决于Ni层和Gd2O3层厚度的比例。结果表明,磁化方向由Gd2O3层指向Ni层。
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