EFFECT OF NOZZLE-SUBSTRATE DISTANCE ON ELECTRICAL, STRUCTURAL AND OPTICAL PROPERTIES OF SnO2 THIN FILMS PREPARED BY SPRAY PYROLYSIS

G. Turgut, D. Tatar, B. Düzgün
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引用次数: 2

Abstract

The physical, electrical and optical properties of SnO2 (TO) thin films deposited using spray pyrolysis technique at different nozzle-to-substrate distances were reported. The solutions consisted of diluted SnCl2.2H2O were sprayed on hot glass substrate which temperature was in 400±5 ˚C. X-ray diffraction (XRD), Uv-vis spectrophotometer and van der Pauw configuration studies had been performed on TO films coated on optical glass substrates. X-ray diffraction pattern revealed the presence of tetragonal crystal structure with (301) preferential orientation for all films. The grain size of the films varied from 23.78 nm to 29.74 nm at different nozzle- substrate distances. The film deposited at 40 cm nozzle-substrate distance had minimum sheet resistance of 3.233 Ω/cm2 and had maximum transmittance at 550 nm of 59.55 %. The best films deposited with optimum nozzle-to-substrate distance (NSD) of 40 cm.
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喷嘴-衬底距离对喷雾热解法制备SnO2薄膜电学、结构和光学性能的影响
报道了喷雾热解法制备的SnO2 (TO)薄膜在不同喷嘴与衬底距离下的物理、电学和光学性能。将稀释后的SnCl2.2H2O溶液喷在温度为400±5℃的热玻璃基板上。利用x射线衍射(XRD)、紫外-可见分光光度计和van der Pauw构型对光学玻璃衬底上涂覆的TO薄膜进行了研究。x射线衍射图显示,所有薄膜均具有(301)择优取向的四方晶体结构。在喷嘴-衬底距离不同的情况下,薄膜的晶粒尺寸在23.78 ~ 29.74 nm之间变化。在喷嘴-衬底距离为40 cm处沉积的薄膜片阻最小为3.233 Ω/cm2,在550 nm处的透射率最大为59.55%。当喷嘴与衬底的最佳距离(NSD)为40 cm时,薄膜的沉积效果最佳。
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