{"title":"Chemical Etching Of SiO/sub 2/ By CF/sub 4/ At Low Pressure- Does It Really Depend On The Plasma Chemistry?","authors":"N. Hershkowitz, J. Ding, J. Jenq","doi":"10.1109/PLASMA.1994.588793","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"74 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PLASMA.1994.588793","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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