A 35 fJ/bit-access sub-VT memory using a dual-bit area-optimized standard-cell in 65 nm CMOS

O. Andersson, B. Mohammadi, P. Meinerzhagen, J. Rodrigues
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引用次数: 9

Abstract

A 128×32 bit ultra-low power (ULP) memory with one read and one write port is presented. A full-custom standard-cell compliant dual-bit latch with two integrated NAND-gates was designed. The NAND-gate realizes the first stage of a read multiplexer. A dense layout reduces the physical cell area by 56 %, compared to a pure commercial standard-cell equivalent. Effectively, an overall memory area reduction of 32%is achieved. The gates are integrated into a digital standard-cell based memory (SCM) flow. Silicon measurements show correct read and write operation deep in the subthreshold domain (sub-VT), down to 370mV, and data is retained down to 320mV. At the energy minimum voltage (450 mV) the memory dissipates 35 fJ/operation.
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采用65纳米CMOS双位面积优化标准单元的35 fJ/bit访问亚vt存储器
提出了一种具有一个读和一个写端口的128×32位超低功耗(ULP)存储器。设计了一个完全定制的标准单元兼容双位锁存器,具有两个集成的nand门。nand门实现读多路复用器的第一级。与纯商用标准电池相比,密集的布局可减少56%的物理电池面积。有效地,总体内存面积减少了32%。这些门被集成到基于数字标准单元的存储器(SCM)流中。硅测量显示正确的读写操作深在亚阈值域(子vt),低至370mV,数据被保留到320mV。在能量最低电压(450毫伏),存储器耗散35 fJ/操作。
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