Crossbar architecture based on 2R complementary resistive switching memory cell

Weisheng Zhao, Yue Zhang, Jacques-Olivier Klein, D. Querlioz, Djaafar Chabi, D. Ravelosona, C. Chappert, J. Portal, M. Bocquet, H. Aziza, D. Deleruyelle, C. Muller
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引用次数: 6

Abstract

Emerging non-volatile memories (e.g. STT-MRAM, OxRRAM and CBRAM) based on resistive switching are under intense R&D investigation by both academics and industries. They provide high performance such as fast write/read speed, low power and good endurance (e.g. >1012) beyond Flash memories. However the conventional access architecture based on 1 transistor + 1 memory cell limits its storage density as the selection transistor should be large enough to ensure enough current for the switching operation. This paper describes a design of crossbar architecture based on 2R complementary resistive switching memory cell. This architecture allows fewer selection transistors, and minimum contacts between memory cells and CMOS control circuits. The complementary cell and parallel data sensing mitigate the impact of sneak currents in the crossbar architecture. We performed transient simulations based on two memory technologies: STT-MRAM and OxRRAM to validate the functionality of this design by using CMOS 65 nm design kit and memory compact models.
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基于2R互补电阻开关存储单元的交叉棒结构
基于电阻开关的新兴非易失性存储器(如STT-MRAM, OxRRAM和CBRAM)正受到学术界和工业界的大力研发研究。他们提供高性能,如快速写入/读取速度,低功耗和良好的耐用性(例如>1012)超越闪存。然而,传统的基于1晶体管+ 1存储单元的存取结构限制了其存储密度,因为选择晶体管必须足够大以保证开关操作所需的足够电流。本文介绍了一种基于2R互补电阻开关存储单元的交叉栅结构设计。这种结构允许更少的选择晶体管,以及存储器单元和CMOS控制电路之间的最小接触。互补单元和并行数据传感减轻了横杆结构中潜流的影响。我们基于STT-MRAM和OxRRAM两种存储技术进行了瞬态仿真,通过使用CMOS 65纳米设计套件和存储紧凑型模型来验证该设计的功能。
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