Electrical conduction and breakdown in amorphous tantalum and niobium oxide films

S. D. Khanin
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Abstract

The paper presents the results of investigating the electronic conduction and destruction of amorphous tantalum and niobium oxides (a-Ta/sub 2/O/sub 5/, a-Nb/sub 2/O/sub 5/) in thin anodic layers on metal surfaces in strong electric fields. It is shown that the breakdown of a highly homogeneous oxide dielectric is preceded by storage processes (dielectric aging).
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无定形氧化钽和氧化铌薄膜的导电和击穿
本文介绍了在强电场作用下金属表面薄阳极层中非晶钽和铌氧化物(a-Ta/sub 2/O/sub 5/, a-Nb/sub 2/O/sub 5/)的电子传导和破坏的研究结果。结果表明,在高度均匀的氧化物电介质击穿之前,会发生储存过程(电介质老化)。
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