Specimen size effect of interface strength distribution induced by grain structure of Cu line

Chuantong Chen, N. Shishido, K. Koiwa, S. Kamiya, H. Sato, M. Nishida, M. Omiya, Takashi Suzuki, Tomoji Nakamura, Toshiaki Suzuki, T. Nokuo
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引用次数: 1

Abstract

©2013 The Japan Society of Mechanical Engineers A new technique for the evaluation of local interface adhesion energy was applied to the interface between Cu and cap layer in a Cu damascene interconnect structure, which consists of both the interfacial fracture test and the finite-element simulation. After specimens in-plane dimensions of 1×1 μm, 5×5 μm and 10×10 μm fractured by focused ion beam (FIB), the interfacial fracture test was implemented by a novel system with nano-indenter in FIB-SEM dual-beam microscope. With the maximum load measured during the fracture test employed in an elastic-plastic simulation, interface adhesion energy was evaluated and almost equal among all types of specimens. On the other hand, the variation of the evaluated interface adhesion energy tends to be larger with the decreasing specimen size. With the result of electron backscattering diffraction analysis for Cu lines whose average grain size were 400nm diameter, it is suggested that local interface strength significantly varies depending on local grain distribution in a Cu interconnect structure.
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Cu线晶粒结构诱导界面强度分布的试样尺寸效应
在Cu damascene互连结构中,将一种评估局部界面粘附能的新技术应用于Cu和帽层之间的界面,该技术包括界面断裂测试和有限元模拟。在聚焦离子束(FIB)破坏平面尺寸为1×1 μm、5×5 μm和10×10 μm的试样后,在FIB- sem双光束显微镜下采用新型纳米压头系统进行界面断裂测试。在弹塑性模拟中,采用断裂试验时所测得的最大载荷,计算了各类型试件的界面黏附能,且界面黏附能基本相等。另一方面,随着试样尺寸的减小,界面黏附能的变化趋于较大。对平均晶粒尺寸为400nm的Cu线进行了电子后向散射衍射分析,结果表明Cu互连结构中局部界面强度随局部晶粒分布的不同而显著变化。
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