Calculation of electron impact ionization co-efficient in β-Ga2O3

Krishnendu Ghosh, U. Singisetti
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引用次数: 13

Abstract

Monoclinic β-Ga2O3 field effect transistors (FETs) have been recently explored for power electronics application [1, 2] due to its large bandgap, and the availability of native substrates. Quantitative impact ionization coefficient (α) values are required to accurately predict the achievable breakdown voltages in these devices. Here, we first report the theoretical calculation of the electron impact ionization co-efficient in β-Ga2O3 by numerically evaluating the electron distribution function at high electric fields using Baraff's method [3]. We have included acoustic deformation potential (ADP) scattering, impurity scattering (IS), polar optical phonon (POP) scattering, and impact ionization (II) scattering in our calculations. Non-polar optical phonons are found to have negligible effects. Cheynoweth exponential fit of the impact ionization coefficient is extracted that can be used in device simulators to optimize the device design for high breakdown voltages.
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β-Ga2O3中电子冲击电离系数的计算
单斜β-Ga2O3场效应晶体管(fet)由于其大带隙和天然衬底的可用性,最近被探索用于电力电子应用[1,2]。在这些器件中,需要定量的冲击电离系数(α)值来准确预测可实现的击穿电压。本文首先利用Baraff方法[3]对β-Ga2O3在高电场下的电子分布函数进行数值计算,得到了β-Ga2O3中电子冲击电离系数的理论计算。我们在计算中包括了声变形势(ADP)散射、杂质散射(IS)、极性光学声子(POP)散射和冲击电离(II)散射。发现非极性光学声子的影响可以忽略不计。提取了碰撞电离系数的Cheynoweth指数拟合,可用于器件模拟器,以优化器件的高击穿电压设计。
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