Investigation of the ZnCuInS/ZnS based Quantum-dot Light-Emitting Diodes with different ZnO Film Thickness Prepared by RF Sputtering

M. M. R. Biswas, Md. Faruk Hossain, H. Okada
{"title":"Investigation of the ZnCuInS/ZnS based Quantum-dot Light-Emitting Diodes with different ZnO Film Thickness Prepared by RF Sputtering","authors":"M. M. R. Biswas, Md. Faruk Hossain, H. Okada","doi":"10.1109/ICEEE54059.2021.9718780","DOIUrl":null,"url":null,"abstract":"In this research work, the performance of the fabricated Quantum-dot Light-Emitting Diode was measured, where the sputtered oxide layer (ZnO) was used as the carrier transport layer, and the thickness of the films were varied to check the current and power efficiency of the devices. The ZnO film was deposited using RF (radio frequency) sputtering process with mixed working gas and substrate temperature of 150°C. The structure of the film was characterized using FE-SEM and a semiconductor parameter analyzer. Moreover, the current efficiency (CE) of 6.55 cd/A was obtained for the ZnCuInS/ZnS-based QLEDs with yellow emission at 580 nm.","PeriodicalId":188366,"journal":{"name":"2021 3rd International Conference on Electrical & Electronic Engineering (ICEEE)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-12-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 3rd International Conference on Electrical & Electronic Engineering (ICEEE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICEEE54059.2021.9718780","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

In this research work, the performance of the fabricated Quantum-dot Light-Emitting Diode was measured, where the sputtered oxide layer (ZnO) was used as the carrier transport layer, and the thickness of the films were varied to check the current and power efficiency of the devices. The ZnO film was deposited using RF (radio frequency) sputtering process with mixed working gas and substrate temperature of 150°C. The structure of the film was characterized using FE-SEM and a semiconductor parameter analyzer. Moreover, the current efficiency (CE) of 6.55 cd/A was obtained for the ZnCuInS/ZnS-based QLEDs with yellow emission at 580 nm.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
射频溅射制备不同ZnO薄膜厚度ZnCuInS/ZnS基量子点发光二极管的研究
在本研究中,采用溅射氧化层(ZnO)作为载流子传输层,测量了所制备的量子点发光二极管的性能,并通过改变薄膜的厚度来检测器件的电流和功率效率。在混合工作气体和衬底温度为150℃的条件下,采用射频溅射工艺沉积ZnO薄膜。利用FE-SEM和半导体参数分析仪对膜的结构进行了表征。此外,在580nm处发射黄色的ZnCuInS/ zns基qled的电流效率(CE)为6.55 cd/A。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Computer-Aided Polyp Removal Detection in Endoscopic Images FPGA based Histogram Equalization for Image Processing Spreading Loss Model for Channel Characterization of Future 6G Terahertz Communication Networks Impact of Cladding Rectangular Bars on the Antiresonant Hollow Core Fiber Predicting Autism Spectrum Disorder Based On Gender Using Machine Learning Techniques
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1