Performance Investigation of a Si/Ge Heterojunction Asymmetric Double Gate DLTFET Considering Temperature and ITC Variations

Suruchi Sharma, R. Basu, B. Kaur
{"title":"Performance Investigation of a Si/Ge Heterojunction Asymmetric Double Gate DLTFET Considering Temperature and ITC Variations","authors":"Suruchi Sharma, R. Basu, B. Kaur","doi":"10.1109/ISQED51717.2021.9424354","DOIUrl":null,"url":null,"abstract":"This manuscript investigates the performance of HJ-ADG-DLTFET considering temperature variations from 200 K-500 K and by varying Interface Trap Charges (ITC) density of negative (NITC) as well as positive polarity (PITC) by utilizing Silvaco ATLAS. This is done by evaluating analog/RF performance parameters such as transconductance $(\\mathrm{g}_{\\mathrm{m}})$, cut-off frequency $(\\mathrm{f}_{\\mathrm{T}})$ and Device efficiency (DE). Furthermore, temperature variations for the range from 200-500 K demonstrate the degradation of the off-state current of HJ-ADGDLTFET. Also, DE enhances at low temperatures.","PeriodicalId":302936,"journal":{"name":"IEEE International Symposium on Quality Electronic Design","volume":"146 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE International Symposium on Quality Electronic Design","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISQED51717.2021.9424354","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

This manuscript investigates the performance of HJ-ADG-DLTFET considering temperature variations from 200 K-500 K and by varying Interface Trap Charges (ITC) density of negative (NITC) as well as positive polarity (PITC) by utilizing Silvaco ATLAS. This is done by evaluating analog/RF performance parameters such as transconductance $(\mathrm{g}_{\mathrm{m}})$, cut-off frequency $(\mathrm{f}_{\mathrm{T}})$ and Device efficiency (DE). Furthermore, temperature variations for the range from 200-500 K demonstrate the degradation of the off-state current of HJ-ADGDLTFET. Also, DE enhances at low temperatures.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
考虑温度和ITC变化的Si/Ge异质结非对称双栅DLTFET性能研究
本文研究了HJ-ADG-DLTFET的性能,考虑温度在200 K-500 K之间的变化,并利用Silvaco ATLAS研究了负极(NITC)和正极(PITC)的界面陷阱电荷(ITC)密度的变化。这是通过评估模拟/RF性能参数来完成的,如跨导$(\ mathm {g}_{\ mathm {m}})$、截止频率$(\ mathm {f}_{\ mathm {T}})$和器件效率(DE)。此外,温度在200-500 K范围内的变化表明了HJ-ADGDLTFET的失态电流的退化。此外,DE在低温下也会增强。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Exploiting Programmable Dipole Interaction in Straintronic Nanomagnet Chains for Ising Problems Emerging Interconnect Exploration for SRAM Application Using Nonconventional H-Tree and Center-Pin Access A2OP: an A* Algorithm OPtimizer with the Heuristic Function for PCB Automatic Routing A Bit-Parallel Deterministic Stochastic Multiplier Beyond Verilog: Evaluating Chisel versus High-level Synthesis with Tiny Designs
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1