{"title":"Laser Induced Thermal Stress in Optical Thin Films","authors":"A. Firth, U. Srinivasan","doi":"10.1364/OIC.2019.THB.8","DOIUrl":null,"url":null,"abstract":"Thermal stress of optical thin film materials SiO2, HfO2, Al2O3, TiO2, and MgF2 exposed to laser pulse is simulated using 2D finite element method. Thermal stress is compressive and MgF2 film has the least value.","PeriodicalId":119323,"journal":{"name":"Optical Interference Coatings Conference (OIC) 2019","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-06-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Interference Coatings Conference (OIC) 2019","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/OIC.2019.THB.8","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
Thermal stress of optical thin film materials SiO2, HfO2, Al2O3, TiO2, and MgF2 exposed to laser pulse is simulated using 2D finite element method. Thermal stress is compressive and MgF2 film has the least value.
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