Study of Optimizing Design Based on Laser Interferometer for Optical Fiber End Face

Abstract

The precision of the microstructure optical elements in the photolithography process will be inevitably affected by some errors, such as etching depth, etching width, alignment and lateral etching. Its performance will be decreased by this errors. Therefore, it's of high research value and practical significance to efficiently measure the surface morphology of microstructure optical elements. On the view of basic principle of interferometric system and improving the performance of the interferometer, the paper introduced the method of optimizing the original low performance laser interferometer and did contrast analysis to ensure the designed laser interferometer could satisfy the requirements of actual measurement.