IF polyphase filter design and calibration with back-gate biasing in 28 nm FD-SOI technology

Mariusz Derlecki, T. Borejko, W. Pleskacz
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Abstract

This paper presents a sixth-order IF polyphase band-pass filter design in 28 nm FD-SOI technology. This filter has been synthesized from a low-pass Butterworth filter prototype. The filter's bandwidth is 1.2 MHz and its center frequency is 2 MHz. A calibration technique using back-gate biasing that is available in fully depleted SOI to minimize the mismatch impact, has been also described. The two filters have been designed using two different types of transistors (regular P/NMOS and flip-well P/NMOS). The power consumption is 1.4 mW. The simulation results of the designed filter have also been presented in this paper.
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28 nm FD-SOI技术中频多相滤波器的设计与校正
本文提出了一种基于28纳米FD-SOI技术的六阶中频多相带通滤波器设计。这个滤波器是由一个低通巴特沃斯滤波器原型合成的。滤波器的带宽为1.2 MHz,中心频率为2 MHz。还描述了一种使用后门偏置的校准技术,该技术可用于完全耗尽的SOI,以最大限度地减少失配影响。这两个滤波器采用两种不同类型的晶体管(常规P/NMOS和翻转阱P/NMOS)设计。功耗为1.4 mW。文中还给出了所设计滤波器的仿真结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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