Jiaoyan Chen, C. Spagnol, S. Grandhi, E. Popovici, S. Cotofana, A. Amaricai
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引用次数: 12
Abstract
With the advent of deep submicron CMOS technology, process parameter statistical variations are increasing resulting in unpredictable device behaviour. The issue is even aggravated by low power requirements which are stretching transistor operation into near/sub threshold regime. Consequently, traditional delay models fail to accurately capture the circuit behaviour. In view of this we introduce an Inverse Gaussian Distribution (IGD) based delay model, which accurately captures the delay distribution under process variations at ultra low, near or below threshold, power supply values. We demonstrate that the IGD model captures the transistor delay distribution with a greater accuracy than the traditional Gaussian one. Moreover it exhibits linear compositionality such that the key model parameters can be straightforward propagated form device/gate level to circuit level. Our simulations indicate that, when compared with Monte Carlo SPICE simulation results, it provides high accuracy, e.g., an average error less than 0.8%, 1.2%, and 1.7% for Majority Voter, XOR gate, and 16-bit Ripple Carry Adder, respectively, while providing orders of magnitude simulation time reductions.
随着深亚微米CMOS技术的出现,工艺参数统计变化正在增加,导致不可预测的器件行为。低功耗要求将晶体管工作扩展到接近/亚阈值范围,这甚至加剧了这个问题。因此,传统的延迟模型不能准确地捕捉电路的行为。鉴于此,我们引入了一种基于逆高斯分布(IGD)的延迟模型,该模型可以准确捕获超低、接近或低于阈值的电源值下过程变化下的延迟分布。我们证明了IGD模型比传统的高斯模型更准确地捕获晶体管延迟分布。此外,它还表现出线性组合性,使得关键模型参数可以直接从器件/栅极级传播到电路级。我们的模拟表明,与Monte Carlo SPICE模拟结果相比,它提供了很高的准确性,例如,对于Majority Voter, XOR门和16位纹波进位加法器,它的平均误差分别小于0.8%,1.2%和1.7%,同时提供了数量级的模拟时间减少。