Energy Gap Evaluation in Microcrystalline m-HfO2 Powder

A. Shilov, S. Savchenko, A. Vokhmintsev, A. Chukin, M. Karabanalov, Maksim I. Vlasov, I. Weinstein
{"title":"Energy Gap Evaluation in Microcrystalline m-HfO2 Powder","authors":"A. Shilov, S. Savchenko, A. Vokhmintsev, A. Chukin, M. Karabanalov, Maksim I. Vlasov, I. Weinstein","doi":"10.17516/1997-1397-2021-14-2-226-231","DOIUrl":null,"url":null,"abstract":"In this paper optical properties of microcrystalline HfO2 powder are investigated. X-ray diffraction and Raman spectroscopy were used to determine that the studied samples are in monoclinic phase. Based on the analysis of the diffuse reflectance spectra and applying Kubelka-Munk formalism we evaluated the indirect bandgap value Eg = 5.34 ± 0.05 eV. The calculated value is in agreement with independent data for HfO2 thin films synthesized by various methods. The paper is based on the materials of the report presented at the first Russian scientific confererence with the participation of the international community \"YENISEI PHOTONICS – 2020\"","PeriodicalId":422202,"journal":{"name":"Journal of Siberian Federal University. Mathematics and Physics","volume":"55 8","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Siberian Federal University. Mathematics and Physics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.17516/1997-1397-2021-14-2-226-231","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

In this paper optical properties of microcrystalline HfO2 powder are investigated. X-ray diffraction and Raman spectroscopy were used to determine that the studied samples are in monoclinic phase. Based on the analysis of the diffuse reflectance spectra and applying Kubelka-Munk formalism we evaluated the indirect bandgap value Eg = 5.34 ± 0.05 eV. The calculated value is in agreement with independent data for HfO2 thin films synthesized by various methods. The paper is based on the materials of the report presented at the first Russian scientific confererence with the participation of the international community "YENISEI PHOTONICS – 2020"
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微晶m-HfO2粉末的能隙评价
本文研究了微晶HfO2粉末的光学性质。用x射线衍射和拉曼光谱测定样品为单斜相。基于漫反射光谱分析,应用Kubelka-Munk公式计算了间接带隙值Eg = 5.34±0.05 eV。计算值与各种方法合成的HfO2薄膜的独立数据一致。本文基于国际社会参与的首届俄罗斯科学会议“YENISEI PHOTONICS - 2020”上提交的报告材料。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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