{"title":"Photonic superlattice multilayers for EUV lithography infrastructure","authors":"F. Kuchar, R. Meisels","doi":"10.1117/12.2322410","DOIUrl":null,"url":null,"abstract":"A numerical study of EUV Bragg mirrors with superstructures is presented. These modifications of the standard Mo/Si mirror are periodic superlattices as well as depth grading of the superlattice multilayers. The main results concern a narrowing of the normal incidence peak and all-angle reflection at 13.5 nm. Best results are obtained with a combination of superlattices with 4 and 5 superperiods and depth grading. The effect of the spectral width of the EUV source is also taken into account.","PeriodicalId":287066,"journal":{"name":"European Mask and Lithography Conference","volume":"46 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-09-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"European Mask and Lithography Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2322410","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
A numerical study of EUV Bragg mirrors with superstructures is presented. These modifications of the standard Mo/Si mirror are periodic superlattices as well as depth grading of the superlattice multilayers. The main results concern a narrowing of the normal incidence peak and all-angle reflection at 13.5 nm. Best results are obtained with a combination of superlattices with 4 and 5 superperiods and depth grading. The effect of the spectral width of the EUV source is also taken into account.
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