A. Azizi, O. Alvarez-Salazar, R. Goullioud, Y. Gursel
{"title":"Metrology system for space interferometry mission system testbed 3","authors":"A. Azizi, O. Alvarez-Salazar, R. Goullioud, Y. Gursel","doi":"10.1117/12.549694","DOIUrl":null,"url":null,"abstract":"A 3-baseline interferometer fourteen metrology gauges are used to monitor changes in the two baselines; calculate the length of the third. Simulation for estimating the third baseline indicates measurement capability better than 1 nm error.","PeriodicalId":277415,"journal":{"name":"Conference on Lasers and Electro-Optics, 2004. (CLEO).","volume":"18 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference on Lasers and Electro-Optics, 2004. (CLEO).","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.549694","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
A 3-baseline interferometer fourteen metrology gauges are used to monitor changes in the two baselines; calculate the length of the third. Simulation for estimating the third baseline indicates measurement capability better than 1 nm error.