Well tapping methodologies in power-gating design

K. Shi, D. Tester
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引用次数: 3

Abstract

65nm and beyond CMOS designs are commonly implemented with “tapless” library cells which do not provide built-in n-well or substrate taps, improving cell density. This cell efficiency results in additional layout complexity for power-gating designs. Three well tapping methods are described for production power-gating designs considering design schedule, leakage power, chip area and complexity.
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电源门控设计中的攻丝方法
65nm及以上的CMOS设计通常采用“无带”文库单元,不提供内置n孔或衬底接头,从而提高了单元密度。这种电池效率导致功率门控设计的额外布局复杂性。在考虑设计进度、漏功率、芯片面积和复杂度的情况下,介绍了生产电源门控设计的三种攻井方法。
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