{"title":"Polycrystalline Silicon Thin Film Obtained By Aluminum Induced Crystallization","authors":"X. Zeng, J. Li, X. Sun, G. Qi, X. Zeng","doi":"10.1142/S1465876303001642","DOIUrl":null,"url":null,"abstract":"This study is on a new approach for fabrication of poly-Si thin films. Aluminum-induced crystallization of a-Si film has been achieved by thermal annealing only at around 400 °C. The Experimental results reveal that the Al on top of a-Si arrangement has more evident effect in crystallization enhancement than that with Al under a-Si, and the resultant poly-Si films show preferred (400) crystal orientation. It is verified that aluminum can cause lateral crystallization of a-Si film. No preferred orientation was noticed from lateral crystallization samples.","PeriodicalId":331001,"journal":{"name":"Int. J. Comput. Eng. Sci.","volume":"143 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Int. J. Comput. Eng. Sci.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1142/S1465876303001642","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract
This study is on a new approach for fabrication of poly-Si thin films. Aluminum-induced crystallization of a-Si film has been achieved by thermal annealing only at around 400 °C. The Experimental results reveal that the Al on top of a-Si arrangement has more evident effect in crystallization enhancement than that with Al under a-Si, and the resultant poly-Si films show preferred (400) crystal orientation. It is verified that aluminum can cause lateral crystallization of a-Si film. No preferred orientation was noticed from lateral crystallization samples.
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