W. Choi, Chung-hyeok Kim, Joon-Ung Lee, Choon-Bae Park, Sung-ill Lee
{"title":"Dielectric properties and microstructure of (Sr.Ca)TiO/sub 3/-based boundary layer capacitor materials","authors":"W. Choi, Chung-hyeok Kim, Joon-Ung Lee, Choon-Bae Park, Sung-ill Lee","doi":"10.1109/ICPADM.1994.413995","DOIUrl":null,"url":null,"abstract":"The dielectric properties and the microstructure of (Sr.Ca)TiO/sub 3/-based boundary layer (BL) capacitor materials were investigated. (Sr.Ca)TiO/sub 3/-based compositions were fired at 1350/spl deg/C in a N/sub 2/ atmosphere to get the base semiconducting ceramics. The metal oxides of CuO were printed on the semiconducting ceramics and fired at 1200/spl deg/C for the subsequent grain boundary diffusion. The grain size of the semiconducting ceramics was 20/spl sim/40 /spl mu/m and the apparent permittivity of the resulting material varied between 2/spl times/10/sup 4/ and 3/spl times/10/sup 4/.<<ETX>>","PeriodicalId":331058,"journal":{"name":"Proceedings of 1994 4th International Conference on Properties and Applications of Dielectric Materials (ICPADM)","volume":"27 3 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1994-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 1994 4th International Conference on Properties and Applications of Dielectric Materials (ICPADM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICPADM.1994.413995","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The dielectric properties and the microstructure of (Sr.Ca)TiO/sub 3/-based boundary layer (BL) capacitor materials were investigated. (Sr.Ca)TiO/sub 3/-based compositions were fired at 1350/spl deg/C in a N/sub 2/ atmosphere to get the base semiconducting ceramics. The metal oxides of CuO were printed on the semiconducting ceramics and fired at 1200/spl deg/C for the subsequent grain boundary diffusion. The grain size of the semiconducting ceramics was 20/spl sim/40 /spl mu/m and the apparent permittivity of the resulting material varied between 2/spl times/10/sup 4/ and 3/spl times/10/sup 4/.<>