Analysis and minimization of practical energy in 45nm subthreshold logic circuits

D. Bol, R. Ambroise, D. Flandre, J. Legat
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引用次数: 53

Abstract

Over the last decade, the design of ultra-low-power digital circuits in subthreshold regime has been driven by the quest for minimum energy per operation. In this contribution, we observe that operating at minimum-energy point is not straightforward as design constraints from real-life applications have an important impact on energy. Therefore, we introduce the alternative concept of practical energy, taking functional-yield and throughput constraints on minimum Vdd into account. In this context, we demonstrate for the first time the detrimental impact of DIBL on minimum Vdd. Practical energy gives a useful analysis framework of circuit optimization to reach minimum-energy point, while considering the throughput as an input variable dictated by the application. From simulation of a benchmark multiplier in 45 nm technology, we find out that practical energy can be far higher than minimum energy point, in the case of low-throughput applications (ap 10-100 kOp/s) because of static leakage energy and robustness-limited minimum Vdd. With the proposed framework, we investigate the capability of conventional optimization techniques to make practical energy meet minimum energy point. Amongst these techniques, channel length upsize is shown to be more efficient than MTCMOS power gating, body biasing, Vt selection or device width upsize, as it increases robustness while simultaneously reducing static leakage energy. A small length upsize with low area overhead is shown to reduce practical energy at low throughput to less than 2.1 times the minimum energy level. At medium throughput, it even brings practical energy 30% lower than minimum energy level without optimization techniques.
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45nm亚阈值逻辑电路中实际能量的分析与最小化
在过去的十年中,亚阈值状态下的超低功耗数字电路的设计一直受到每次操作最小能量的追求的驱动。在这篇文章中,我们观察到在最小能量点操作并不简单,因为来自实际应用的设计约束对能量有重要影响。因此,我们引入实用能量的替代概念,考虑到最小Vdd的功能产率和吞吐量约束。在这种情况下,我们首次证明了DIBL对最小Vdd的有害影响。实际能量给出了一个有用的电路优化分析框架,以达到最小能量点,同时考虑吞吐量作为一个输入变量由应用决定。通过对45纳米技术的基准倍增器的模拟,我们发现在低吞吐量应用(ap 10-100 kOp/s)的情况下,由于静态泄漏能量和鲁棒性限制的最小Vdd,实际能量可能远高于最小能量点。在此框架下,我们考察了传统优化技术使实际能量满足最小能量点的能力。在这些技术中,通道长度增大被证明比MTCMOS功率门控、体偏置、Vt选择或器件宽度增大更有效,因为它增加了鲁棒性,同时减少了静态泄漏能量。具有低面积开销的小长度增大可以在低吞吐量时将实际能量降低到最小能量水平的2.1倍以下。在中等吞吐量下,在没有优化技术的情况下,实际能量甚至比最低能量水平低30%。
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