Application of solid phase direct write (SPDW) via scanning force microscopy for electrical devices and sensors

Abstract

Solid phase direct-write (SPDW) patterning is a promising technique for nanoscale device fabrication. It enables the deposition of a range of materials with the precision and relatively low cost inherent in scanning force microscopy. The ability to deposit controlled 2D and 3D patterns at the nanometer scale and image them with the same instrument adds versatility to nanodevice design and fabrication. This technique works by loading an atomic force microscopy tip with a solid phase "ink" then reversing the process to write a pattern. Linewidths between 40nm and 500nm can be written, with the dimension varied by user specified parameters. To date, four materials have been successfully deposited: carbon, silicon, tungsten oxide and molybdenum oxide. This report presents an overview of SPDW and its application to the direct write fabrication of electronic devices.