Performance Comparison of Thin-Film Transistors Fabricated Using Different Purity Semiconducting Nanotubes

K. C. Narasimhamurthy, R. Paily
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引用次数: 1

Abstract

In this paper, fabrication and characterization of semi conducting nanotube thin-film transistors (SN-TFTs) using 90% and 95% purity semi conducting single walled carbon nanotubes (SWCNTs) are presented. The wafer scale fabrication of SN-TFTs are carried out on 2 inch Si wafers. Pre-separated semi conducting SWCNTs are deposited on amino-silane treated Si/SiO2 surface. A simple method is suggested for silanization in order to improve the carbon nanotube density more than 30 nanotubes/¹m2. SN-TFTs fabricated using both 90% and 95% enriched semi conducting SWCNTs have exhibited p-type output characteristic with excellent linear and saturation region of operation along with high on-off current ratio and steep sub threshold slope.
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不同纯度半导体纳米管制备薄膜晶体管的性能比较
本文介绍了用纯度为90%和95%的单壁碳纳米管(SWCNTs)制备和表征半导体纳米管薄膜晶体管(SN-TFTs)。sn - tft的晶圆级制造是在2英寸硅晶圆上进行的。预分离的半导体SWCNTs沉积在氨基硅烷处理的Si/SiO2表面。为了将碳纳米管密度提高到30纳米管/¹m2以上,提出了一种简单的硅烷化方法。利用富集90%和95%的半导体SWCNTs制备的sn - tft具有p型输出特性,具有良好的线性和饱和工作区,高通断电流比和陡峭的亚阈值斜率。
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