On the parameter extraction of short channel UTBB-FDSOI FET’s with high-κ metal gate and TCAD modelling

L. Trojman, A. Vaca, L. Prócel
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Abstract

In this work an extraction method is proposed to obtain the electric and physical parameters of Ultra-Thin Body and Buried Oxide (UTBB) Fully Depleted SOI MOSFET with short channel length (below 100 nm). In order to check the accuracy of the extraction method, model is built using a TCAD with these parameters. We found that the simulation shows a very good agreement with the experimental curves. However, an improvement of the mobility model and a better definition of the extension of the model used in the TCAD is needed to get a perfect matching between the experimental and the simulated curves.
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高κ金属栅极短通道UTBB-FDSOI场效应管参数提取及TCAD建模
本文提出了一种提取短沟道长度(小于100 nm)的超薄体和埋藏氧化物(UTBB)完全耗尽SOI MOSFET的电学和物理参数的方法。为了检验提取方法的准确性,利用TCAD建立了这些参数的模型。仿真结果与实验曲线吻合较好。然而,为了使实验曲线与模拟曲线完美匹配,需要对迁移率模型进行改进,并对TCAD中使用的模型的扩展进行更好的定义。
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