Two-Regime Hole Opening Process in Tellurium-Alloy Films

M. Chen, V. Marrello, U. G. Gerber
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Abstract

Single layer (≃ 300A thick) Te and Te-alloy films on polymethylmethacrylate substrates are widely studied for possible use as optical recording media. The ablative hole formation process in such media is however still poorly understood. In this paper, data is presented to show that ablative writing in Te-alloy films has two hole opening regimes. This two regime hole opening process is shown to lead to a qualitative understanding of the contrast ratio versus writing laser power characteristics of Te-alloy films.
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碲合金薄膜的双态开孔工艺
在聚甲基丙烯酸甲酯基体上的Te和Te合金薄膜作为光记录介质被广泛研究。然而,在这种介质中烧蚀孔的形成过程仍然知之甚少。本文给出的数据表明,te合金薄膜中的烧蚀书写有两种开孔机制。这两种模式的开孔过程可以定性地理解te合金薄膜的对比度与写入激光功率的特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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