Shunting Z-Pinch by Load by Plasma Switch Installed in a Magnetically Isolated Transmission Line

V. Kokshenev
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Abstract

A planar plasma source based on a high-current discharge in a dielectric capillary has been created, which allows the formation of high-speed plasma flows with a density of at least 10−7g/cm3. Using a metal plasma duct, a uniform planar flow was obtained, having a speed of $9\ \text{cm}/ \mu\mathrm{s}$ and an angle of opening of the plasma jet of ∼ 20°. A switch based on the created planar plasma source made it possible to implement a controlled mode of shunting the inductive load with a mega-ampere current from the discharge circuit of the primary energy storage device.
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安装在磁隔离传输线上的等离子体开关按负载分流z -箝位
基于介质毛细管中大电流放电的平面等离子体源已经被创建,它允许形成密度至少为10−7g/cm3的高速等离子体流。利用金属等离子体管道,获得了均匀的平面流,速度为$9\ \text{cm}/ \mu\ mathm {s}$,等离子体射流的开口角为~ 20°。基于所创建的平面等离子体源的开关使得实现从初级储能装置的放电电路中以兆安培电流分流感应负载的控制模式成为可能。
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