{"title":"MEASUREMENT OF COMPOSITION AND DOPANT CONCENTRATION OF SEMICONDUCTORS USING FT-IR SPECTROSCOPY","authors":"B. Choi, J. Hebb, M. Flik","doi":"10.1615/istp-vi.560","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":168856,"journal":{"name":"Proceeding of Transport Phenomena in Thermal Engineering. Volume 2","volume":"17 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceeding of Transport Phenomena in Thermal Engineering. Volume 2","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1615/istp-vi.560","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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