An adaptive EWMA mean chart in the presence of outliers

IF 2.3 2区 工程技术 Q3 ENGINEERING, INDUSTRIAL Quality Technology and Quantitative Management Pub Date : 2023-09-14 DOI:10.1080/16843703.2023.2257988
Abdul Haq
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Abstract

ABSTRACTOccasional outliers that might be a natural part of a process may distort the properties of a control chart. In this paper, we show that a recently proposed adaptive EWMA (AE) mean chart is highly sensitive to the outliers. The false alarm rate of the AE chart increases when the proportion and/or magnitude of the outliers increase and vice versa. In order to circumvent this demerit of the AE chart, we propose a truncated normal distribution-based AE (TAE) chart for monitoring the mean of a normal process in the presence of outliers. The zero-state and steady-state average run-length profiles of the proposed chart are estimated using Monte Carlo simulations. Based on detailed run-length comparisons, it is found that the TAE chart may outperform the existing EWMA chart (based on a truncated normal distribution) when detecting various mean shift sizes of an outlier-prone normal process. Illustrative examples are also included in this study to demonstrate the implementation of the existing and proposed charts.KEYWORDS: Control chartadaptive EWMAMonte Carlo simulationprocess meanrun length propertiesstatistical process control AcknowledgementsThe author is thankful to the associate editor and two anonymous reviewers for providing useful comments that led to an improved version of the article.Disclosure statementNo potential conflict of interest was reported by the author(s).Additional informationNotes on contributorsAbdul HaqAbdul Haq is an Associate Professor at the Department of Statistics, Quaid-i-Azam University, Islamabad, Pakistan. His research interest is in Statistical Process Monitoring.
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一种存在异常值的自适应EWMA平均图
偶尔的异常值可能是一个过程的自然组成部分,可能会扭曲控制图的属性。在本文中,我们证明了最近提出的自适应EWMA (AE)平均图对异常值高度敏感。当异常值的比例和/或量级增加时,声发射图的虚警率增加,反之亦然。为了规避声发射图的这一缺点,我们提出了一个基于截短正态分布的声发射(TAE)图,用于监测存在异常值的正态过程的平均值。利用蒙特卡罗模拟估计了所提出的图表的零状态和稳态平均游程分布。通过详细的运行长度比较,我们发现TAE图在检测异常值倾向的正态过程的各种平均位移大小时,可能优于现有的EWMA图(基于截断的正态分布)。本研究亦以举例说明现有及拟议图表的实施情况。关键词:控制图自适应ewmammonte Carlo模拟过程平均运行长度属性统计过程控制致谢作者感谢副编辑和两位匿名审稿人提供的有用意见,使文章得以改进。披露声明作者未报告潜在的利益冲突。本文作者sabdul HaqAbdul Haq是巴基斯坦伊斯兰堡Quaid-i-Azam大学统计系副教授。主要研究方向为统计过程监控。
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来源期刊
Quality Technology and Quantitative Management
Quality Technology and Quantitative Management ENGINEERING, INDUSTRIAL-OPERATIONS RESEARCH & MANAGEMENT SCIENCE
CiteScore
5.10
自引率
21.40%
发文量
47
审稿时长
>12 weeks
期刊介绍: Quality Technology and Quantitative Management is an international refereed journal publishing original work in quality, reliability, queuing service systems, applied statistics (including methodology, data analysis, simulation), and their applications in business and industrial management. The journal publishes both theoretical and applied research articles using statistical methods or presenting new results, which solve or have the potential to solve real-world management problems.
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