The design of two-sided S2-chart with estimated in-control process variance based on conditional median run length

IF 2.3 2区 工程技术 Q3 ENGINEERING, INDUSTRIAL Quality Technology and Quantitative Management Pub Date : 2023-09-16 DOI:10.1080/16843703.2023.2255046
Nirpeksh Kumar, Sonam Jaiswal
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Abstract

ABSTRACTMonitoring both decrease and increase in the process variance has a significant value in effectively implementing any quality improvement program. This paper considers the Phase II two-sided S2-chart with estimated in-control (IC) process variance and evaluates its performance under the conditional perspective. The conditional perspective focuses on the conditional (given parameter estimates) IC run length distribution and its associated properties to evaluate chart’s performance with estimated parameters. Thus, it accounts for the practitioner-to-practitioner variability and, hence, provides a comprehensive understanding of the chart’s performance. To guard against unnecessary false alarms, we design the chart using the exceedance probability criterion under the conditional perspective, which ensures the desired IC performance with a high probability. Furthermore, because the median run length (MRL) is a more suitable representative of run length (RL) distribution, we examine the chart’s performance in terms of the median of the conditional RL distribution. We also discuss the biasedness property of the two-sided S2-chart, which is an outcome of the skewed nature of the charting statistic. It is shown that the proposed MRL-unbiased chart requires about within 500 Phase I observations to achieve a reasonably good IC and OOC performance.KEYWORDS: Average run lengthconditional and unconditional performanceexceedance probability criteriaconditional run lengthunbiasedness AcknowledgementsThe authors thank the anonymous referees and the editor for their valuable comments. First author’s work was supported by the Banaras Hindu University, India under the IoE Scheme (Grant Number 6031). The second author’s work was supported by a Research Fellowship from University Grant Commission (UGC), India within the scope of the doctoral program at the Department of Science and Technology-Centre for Interdisciplinary Mathematical Sciences (DST-CIMS), Banaras Hindu University, Varanasi.Disclosure statementNo potential conflict of interest was reported by the author(s).Additional informationFundingThe work was supported by the Banaras Hindu University with grant number IoE-6031.Notes on contributorsNirpeksh KumarNirpeksh Kumar is an associate professor at the Department of Statistics, Banaras Hindu University, Varanasi (BHU), India. He received his Master’s and PhD degree in Statistics from the University of Allahabad, India. He was awarded SARChi Postdoctoral fellowship at the Department of Statistics, University of Pretoria, South Africa. He has published in numerous accredited peer-reviewed journals and has presented his research at several national and international conferences. His research interests include statistical outlier detection, statistical process/quality control, and time series analysis.Sonam JaiswalSonam Jaiswal has an MSc degree in Statistics and Computing from the DST Center for interdisciplinary Mathematical Sciences (DST-CIMS) at BHU, India. She is currently a PhD student at DST-CIMS, BHU. Her main area of research interest is in statistical process/quality control.
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基于条件中位数运行长度估计控制过程方差的双侧s2图设计
监控过程方差的减少和增加对于有效地实施任何质量改进计划都具有重要的价值。本文考虑具有预估控制(IC)过程方差的第II阶段双面s2图,并在条件视角下评价其性能。条件视角侧重于条件(给定参数估计)IC运行长度分布及其相关属性,以评估具有估计参数的图表性能。因此,它解释了从业者与从业者之间的可变性,并因此提供了对图表性能的全面理解。为了防止不必要的误报,我们在条件视角下使用超出概率准则设计图表,以高概率保证期望的IC性能。此外,由于中位数运行长度(MRL)是运行长度(RL)分布的更合适代表,我们根据条件RL分布的中位数来检查图表的性能。我们还讨论了双面s2图的偏倚性,这是图表统计量偏倚性的结果。结果表明,所提出的mrl无偏图需要大约500个I期观测值才能获得相当好的IC和OOC性能。关键词:平均运行长度条件和无条件性能超越概率标准条件运行长度无偏致谢感谢匿名审稿人和编者的宝贵意见。第一作者的工作由印度巴纳拉斯印度教大学根据IoE计划(资助号6031)提供支持。第二作者的工作得到了印度大学资助委员会(UGC)在瓦拉纳西巴纳拉斯印度教大学科学与技术中心(DST-CIMS)博士课程范围内的研究奖学金的支持。披露声明作者未报告潜在的利益冲突。本研究由巴纳拉斯印度教大学资助,资助号为IoE-6031。作者简介:nirpeksh Kumar,印度瓦拉纳西巴纳拉斯印度教大学统计系副教授。他在印度阿拉哈巴德大学获得统计学硕士和博士学位。曾获南非比勒陀利亚大学统计学系SARChi博士后奖学金。他曾在众多认可的同行评审期刊上发表文章,并在多个国家和国际会议上发表了他的研究成果。主要研究方向为统计异常值检测、统计过程/质量控制、时间序列分析。Sonam Jaiswal拥有印度BHU DST跨学科数学科学中心(DST- cims)的统计和计算硕士学位。她目前是北京大学科技部- cims的博士生。她的主要研究领域是统计过程/质量控制。
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来源期刊
Quality Technology and Quantitative Management
Quality Technology and Quantitative Management ENGINEERING, INDUSTRIAL-OPERATIONS RESEARCH & MANAGEMENT SCIENCE
CiteScore
5.10
自引率
21.40%
发文量
47
审稿时长
>12 weeks
期刊介绍: Quality Technology and Quantitative Management is an international refereed journal publishing original work in quality, reliability, queuing service systems, applied statistics (including methodology, data analysis, simulation), and their applications in business and industrial management. The journal publishes both theoretical and applied research articles using statistical methods or presenting new results, which solve or have the potential to solve real-world management problems.
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