Investigation of mechanical and microstructural properties of sputter-deposited Zr-Ni3Al coatings

IF 2.4 3区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS Journal of Vacuum Science & Technology A Pub Date : 2023-10-17 DOI:10.1116/6.0003022
Sunil Kumar Tiwari, Akula Umamaheswara Rao, Archana Singh Kharb, Vipin Chawla, Neha Sardana, Devesh Kumar Avasthi, Amit Kumar Chawla
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引用次数: 1

Abstract

Zr-doped Ni3Al alloy coatings were deposited on a silicon substrate using DC magnetron cosputtering at a substrate temperature of 400 °C. The transformation of phase, microstructure, and surface topography was investigated using GIXRD, field emission scanning electron microscopy, and atomic force microscopy, respectively. The effect of zirconium (Zr) concentration on the microstructure and mechanical properties of Ni3Al coatings has been discussed. It is observed that the high concentration of Zr in Ni3Al coatings led to the evolution of microcracks that further contributes to increasing the surface roughness of the coatings. Results revealed that the Ni3Al coating without Zr content exhibited the highest hardness of 12.8 GPa. It is also found that with the increase in Zr content in host Ni3Al coatings, the hardness decreases, whereas the contact angle increases. Ni3Al coatings with 40 W Zr enrichment showed a hydrophobic nature with a contact angle of 101°.
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溅射沉积Zr-Ni3Al涂层的力学和显微组织性能研究
采用直流磁控溅射技术,在400℃的衬底温度下,在硅衬底上沉积了掺杂zr的Ni3Al合金涂层。采用GIXRD、场发射扫描电镜和原子力显微镜分别对合金的相转变、微观结构和表面形貌进行了研究。讨论了锆(Zr)浓度对Ni3Al涂层显微组织和力学性能的影响。结果表明,Ni3Al涂层中高浓度的Zr导致了微裂纹的形成,从而提高了涂层的表面粗糙度。结果表明,不含Zr的Ni3Al涂层硬度最高,达到12.8 GPa。随着基体Ni3Al涂层中Zr含量的增加,涂层硬度降低,接触角增大。富集40w Zr的Ni3Al涂层具有疏水性,接触角为101°。
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来源期刊
Journal of Vacuum Science & Technology A
Journal of Vacuum Science & Technology A 工程技术-材料科学:膜
CiteScore
5.10
自引率
10.30%
发文量
247
审稿时长
2.1 months
期刊介绍: Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.
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