β-Ga2O3 orientation dependence of band offsets with SiO2 and Al2O3

IF 2.4 3区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS Journal of Vacuum Science & Technology A Pub Date : 2023-09-22 DOI:10.1116/6.0003039
Hsiao-Hsuan Wan, Jian-Sian Li, Chao-Ching Chiang, Xinyi Xia, David C. Hays, Fan Ren, Stephen J. Pearton
{"title":"β-Ga2O3 orientation dependence of band offsets with SiO2 and Al2O3","authors":"Hsiao-Hsuan Wan, Jian-Sian Li, Chao-Ching Chiang, Xinyi Xia, David C. Hays, Fan Ren, Stephen J. Pearton","doi":"10.1116/6.0003039","DOIUrl":null,"url":null,"abstract":"Two of the most common dielectrics for β-Ga2O3 are SiO2 and Al2O3 because of their large bandgaps, versatility of preparation, and thermal stability. However, because of the anisotropic properties of the β-polytype, it is necessary to understand differences in band alignment for the different crystal orientation. Using x-ray photoelectron spectroscopy, we performed a comparative study of the band alignment of SiO2/β-Ga2O3 and Al2O3/ β-Ga2O3 heterojunctions with different β-Ga2O3 orientations of (001), (010), and (2¯01). The bandgaps were determined to be 4.64, 4.71, and 4.59 eV for the (2¯01), (001), and (010) oriented β-Ga2O3 substrates, respectively. The valence band offsets for SiO2 on these three orientations were 1.4, 1.4, and 1.1 eV, respectively, while for Al2O3, the corresponding values were 0.0, 0.1, and 0.2 eV, respectively. The corresponding conduction band offsets ranged from 2.59 to 3.01 eV for SiO2 and 2.26 to 2.51 eV for Al2O3.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":null,"pages":null},"PeriodicalIF":2.4000,"publicationDate":"2023-09-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science & Technology A","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/6.0003039","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 0

Abstract

Two of the most common dielectrics for β-Ga2O3 are SiO2 and Al2O3 because of their large bandgaps, versatility of preparation, and thermal stability. However, because of the anisotropic properties of the β-polytype, it is necessary to understand differences in band alignment for the different crystal orientation. Using x-ray photoelectron spectroscopy, we performed a comparative study of the band alignment of SiO2/β-Ga2O3 and Al2O3/ β-Ga2O3 heterojunctions with different β-Ga2O3 orientations of (001), (010), and (2¯01). The bandgaps were determined to be 4.64, 4.71, and 4.59 eV for the (2¯01), (001), and (010) oriented β-Ga2O3 substrates, respectively. The valence band offsets for SiO2 on these three orientations were 1.4, 1.4, and 1.1 eV, respectively, while for Al2O3, the corresponding values were 0.0, 0.1, and 0.2 eV, respectively. The corresponding conduction band offsets ranged from 2.59 to 3.01 eV for SiO2 and 2.26 to 2.51 eV for Al2O3.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
β-Ga2O3与SiO2和Al2O3波段偏移的取向依赖性
β-Ga2O3最常用的两种介质是SiO2和Al2O3,因为它们具有较大的带隙、制备的通用性和热稳定性。然而,由于β-多型的各向异性,有必要了解不同晶体取向下的能带排列差异。利用x射线光电子能谱对β-Ga2O3取向为(001)、(010)和(2¯01)的SiO2/β-Ga2O3和Al2O3/ β-Ga2O3异质结的能带排列进行了比较研究。结果表明,(2¯01)、(001)和(010)取向β-Ga2O3基板的带隙分别为4.64、4.71和4.59 eV。SiO2在这三个取向上的价带偏移分别为1.4、1.4和1.1 eV, Al2O3的价带偏移分别为0.0、0.1和0.2 eV。相应的导带偏移量SiO2为2.59 ~ 3.01 eV, Al2O3为2.26 ~ 2.51 eV。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Journal of Vacuum Science & Technology A
Journal of Vacuum Science & Technology A 工程技术-材料科学:膜
CiteScore
5.10
自引率
10.30%
发文量
247
审稿时长
2.1 months
期刊介绍: Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.
期刊最新文献
ToF-SIMS analysis of ultrathin films and their fragmentation patterns. Spinel LiGa5O8 prospects as ultra-wideband-gap semiconductor: Band structure, optical properties, and doping Dislocation avalanches in nanostructured molybdenum nanopillars Plasma nitridation for atomic layer etching of Ni Hardness, adhesion, and wear behavior of magnetron cosputtered Ti:Zr-O-N thin films
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1