ZnOバリスタにおけるAl添加効果の解明と伝導機構モデルの構築

Hideyuki OKINAKA, Wataru SAKAMOTO
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Abstract

The effect of Al addition in ZnO varistors revealed to be the suppression of grain growth, not the lowering of the electric resistance of ZnO. This Al effect can explain the change in the E-J characteristics by the following three points. (i) The grain boundary becomes thinner and the proportion of boundary layers with a thickness of 10 nm or less increases, which enlarges the effective cross-sectional area of the tunnel current generation. (ii) The delay in densification during the sintering makes it easier for pores to remain at the grain boundary, which increases discontinuities of boundary layers between ZnO grains and increases leakage current, resulting in reduced non-ohmic properties in the low current range. (iii) Abnormal grain growth of ZnO is suppressed and the particle size becomes more uniform, which improves non-ohmic characteristics. This paper proposes a new barrier model for the conduction mechanism of ZnO varistors, based on the tunneling effect and taking into account the influences caused by microstructural inhomogeneities specific to polycrystalline ceramics, such as discontinuities in grain boundary layers and variations in ZnO grain size.
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ZnO变阻器中Al添加效果的阐明和传导机制模型的构建
在ZnO压敏电阻器中添加Al的作用是抑制晶粒生长,而不是降低ZnO的电阻。这种Al效应可以从以下三点解释E-J特性的变化。(1)晶界变薄,厚度小于等于10 nm的边界层比例增加,增大了隧道电流产生的有效截面积。(ii)烧结过程中致密化的延迟使晶粒边界上的孔隙更容易保留,从而增加了ZnO晶粒间边界层的不连续,增加了漏电流,导致低电流范围内的非欧姆性能降低。(iii)抑制了ZnO的异常晶粒生长,晶粒尺寸变得更加均匀,改善了ZnO的非欧姆特性。本文提出了一种新的ZnO压敏电阻传导机制的势垒模型,该模型基于隧道效应,并考虑了多晶陶瓷特有的微观结构不均匀性(如晶界层的不连续和ZnO晶粒尺寸的变化)所造成的影响。
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