Primary processes in the 121.6 nm photolysis of gas phase ethyl bromide

Kyung-Hoon Jung, Dae Kon Oh, Kosuke Shobatake
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Abstract

The vacuum UV photolysis of ethyl bromide at 121.6 nm (235.2 kcal mol−1) has been studied over the pressure range 0.5 – 100 Torr at room temperature using a hydrogen atom resonance lamp. The scavenger effect of the reaction was observed by adding NO gas as a radical scavenger. The pressure effect was also investigated with CF4 as an additive. The major products of the reaction were CH4, C2H4, C2H6, C2H2 and CH3CHBr2 via a two-channel competition between molecular elimination and the formation of radicals. The decomposition modes in the primary process were 58.7% molecular elimination and 41.3% radical reaction. It was estimated that the portion of hot C2H4 molecules produced through the molecular elimination process with more than the threshold energy (E0 = 80 kcal (mol−1) for decomposition to C2H2 was 25% of the total energy distribution.

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气相溴乙基121.6 nm光解的主要工艺
在室温条件下,在0.5 ~ 100 Torr的压力范围内,用氢原子共振灯研究了121.6 nm (235.2 kcal mol−1)的真空紫外光解溴乙基。通过加入NO气体作为自由基清除剂,观察了反应的清除效果。以CF4为添加剂,考察了压力效应。通过分子消除和自由基形成的双通道竞争,反应的主要产物为CH4、C2H4、C2H6、C2H2和CH3CHBr2。初级过程的分解方式为58.7%的分子消除和41.3%的自由基反应。据估计,通过分子消除过程产生的热C2H4分子中,超过分解成C2H2的阈值能量(E0 = 80 kcal (mol−1))的部分占总能量分布的25%。
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