M. V. Strelkov, A. M. Chekushkin, A. A. Lomov, S. V. Kraevskii, M. Yu. Fominskii, M. A. Tarasov
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引用次数: 0
Abstract
A series of studies of the structure of aluminum films deposited on single-crystal silicon substrates in different temperature regimes has been carried out. The roughness and grain size of 20-nm thick films of nuclei deposited at elevated temperatures and also dusted over the nucleus layer at room temperature to a thickness of 150 nm was studied using an atomic force microscope. The film profile was measured in an electron microscope. It is found that films on a hot sublayer turn out to be smoother, more rigid (less friable), and make it possible to expect the creation of superconductor–insulator–superconductor and superconductor–insulator–normal metal transitions with a higher current density and lower capacitance, respectively.
期刊介绍：
Journal of Communications Technology and Electronics is a journal that publishes articles on a broad spectrum of theoretical, fundamental, and applied issues of radio engineering, communication, and electron physics. It publishes original articles from the leading scientific and research centers. The journal covers all essential branches of electromagnetics, wave propagation theory, signal processing, transmission lines, telecommunications, physics of semiconductors, and physical processes in electron devices, as well as applications in biology, medicine, microelectronics, nanoelectronics, electron and ion emission, etc.
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